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単層酸化グラフェン(H法/輸入)
簡単な説明:単層酸化グラフェン(H法/輸入)Single Layer Graphene Oxide(H Method)製造方法:改良されたH法直径:1 ~ 5 um厚さ:0.8 ~ 1.2 nm単層比:99%純度:99%堆積密度:0.44 g/cm 3体積密度:0.26 g/cm 3
製品の詳細
単層酸化グラフェン(H法/輸入)Single Layer Graphene Oxide(H Method)
製造方法:改良H法
直径:1 ~ 5 um
厚さ:0.8 ~ 1.2 nm
単層比:99%
純度:99%
堆積密度:0.44 g/cm3
体積密度:0.26 g/cm3
単層酸化グラフェン(H法/輸入)Single Layer Graphene Oxide(H Method)
製造方法:改良H法
直径:1 ~ 5 um
厚さ:0.8 ~ 1.2 nm
単層比:99%
純度:99%
堆積密度:0.44 g/cm3
体積密度:0.26 g/cm3

TEM of Graphene Oxide


*The TEM analysis was completed through dispersing ACS-Material Graphene Oxide into water or ethanol with the help of ultrasound

TEM of Graphene Oxide


*The TEM analysis was completed through dispersing ACS-Material Graphene Oxide into water or ethanol with the help of ultrasound
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